Method and apparatus for generating highly dense uniform plasma in a high frequency electric fieldWord格式.docx

Method and apparatus for generating highly dense uniform plasma in a high frequency electric fieldWord格式.docx

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andathirdstepofapplying,totheplasmageneratingpart,amagneticfieldsubstantiallyatarightangletotheworkingplaneofthehighfrequencyrotatingelectricfield,therebytoconvertthetranslationalmovementoftheelectronsintheplasmageneratingpartintorevolvingmotionsunderoscillatingorrotatingmotionsbywhichtheelectronsrevolveintheplasmageneratingpart.Thehighfrequencyrotatingelectricfieldandthemagneticfieldcausetheelectronsintheplasmageneratingparttobeconfinedtherein.

Claims

Whatisclaimedis:

1.Aplasmageneratingmethodcomprising:

afirststepofdisposingthreeofmorelateralelectrodesatlateralsidesofaplasmageneratingpartinavacuumchamber;

asecondstepofrespectivelyapplying,tosaidlateralelectrodes,highfrequencyelectricpowersofwhichfrequenciesarethesameasoneanotherandofwhichphasesaredifferentfromoneanother,therebytoexcite,insaidplasmageneratingpart,ahighfrequencyrotatingelectricfieldtocauseelectronsundertranslationalmotionsinsaidplasmageneratingparttopresentrotatingmotionswithtranslationalmovementcomponent;

and

athirdstepofapplying,tosaidplasmageneratingpart,amagneticfieldsubstantiallyatarightangletotheworkingplaneofsaidhighfrequencyrotatingelectricfield,therebytoconvertsaidtranslationalmovementofsaidelectronsunderrotatingmotionsinsaidplasmageneratingpartintorevolvingmovementbywhichsaidelectronsrevolveinsaidplasmageneratingpart;

saidelectronsinsaidplasmageneratingpartbeingconfinedtherein.

2.Aplasmageneratingmethodaccordingtoclaim1,wherein

thethirdstepcomprisesastepofapplying,tosaidplasmageneratingpart,amagneticfieldsubstantiallyatarightangletotheworkingplaneofsaidhighfrequencyrotatingelectricfield,therebytoconvertsaidtranslationalmovementofsaidelectronsunderrotatingmotionsinsaidplasmageneratingpartintorevolvingmovementbywhichsaidelectronsrevolveinsaidplasmageneratingpartinadirectionidenticalwithorreversetothedirectionofsaidrotationalmotions.

3.Aplasmageneratingmethodaccordingtoclaim1,whereinthemagneticfieldatthethirdstepissteadywiththepassageoftime.

4.Aplasmageneratingmethodaccordingtoclaim1,whereinthemagneticfieldatthethirdstepisunsteadywiththepassageoftime.

5.Aplasmageneratingmethodaccordingtoclaim1,whereinthehighfrequencyelectricpowersatthesecondsteparegreaterthan1MHz,andtheabsolutevalueoftheintensityofthemagneticfieldatthethirdstepisgreaterthan2G.

6.Aplasmageneratingmethodaccordingtoclaim1,whereinthefollowingrelationshipisestablishedamongthefrequencyf（MHz）ofthehighfrequencyelectricpowersatthesecondstep,theintensityE（V/cm）oftherotationalelectricfieldexcitedbysaidhighfrequencyelectricpowersandtheabsolutevalueB（G）oftheintensityofthemagneticfieldatthethirdstep:

1<

E/Bf<

50

7.Aplasmageneratingmethodaccordingtoclaim1,whereintheintensityofthemagneticfieldatthethirdstepisgreaterattheperipheryoftheplasmageneratingpartthanatthecenterthereof.

8.Aplasmageneratingmethodaccordingtoclaim1,whereinthewallofthevacuumchamberismadeofanonmagneticmaterial.

9.Aplasmageneratingmethodaccordingtoclaim1,whereinthewallofthevacuumchamberismagneticallyshielded.

10.Aplasmageneratingapparatuscomprising:

threeormorelateralelectrodesdisposedatlateralsidesofaplasmageneratingpartinavacuumchamber;

highfrequencyelectricpowerapplyingmeansforapplying,tosaidlateralelectrodes,respectivehighfrequencyelectricpowersofwhichfrequenciesarethesameasoneanotherandofwhichphasesaredifferentfromoneanother,therebytoexcite,insaidplasmageneratingpart,ahighfrequencyrotatingelectricfieldtocauseelectronsundertranslationalmotionsinsaidplasmageneratingparttopresentrotatingmotions;

magneticfieldapplyingmeansforapplyingamagneticfieldsubstantiallyatarightangletotheworkingplaneofsaidhighfrequencyrotatingelectricfield,therebytoconvertsaidtranslationalmovementofsaidelectronsunderrotatingmotionsinsaidplasmageneratingpartintorevolvingmovementbywhichsaidelectronsrevolveinsaidplasmageneratingpartsuchthatsaidelectronsinsaidplasmageneratingpartareconfinedtherein.

11.Aplasmageneratingapparatusaccordingtoclaim10,furthercomprising:

asamplestagedisposedatalowerpartoftheplasmageneratingpartinsideofthevacuumchamber;

anoppositeelectrodedisposedatanupperpartofsaidplasmageneratingpartinsideofsaidvacuumchamber.

12.Aplasmageneratingapparatusaccordingtoclaim11,whereinabiasvoltageisappliedtothesamplestageforirradiatingaplasmatoasampletobeplacedonsaidsamplestage.

13.Aplasmageneratingapparatusaccordingtoclaim11,furthercomprisingtemperaturecontrolmeansforcontrollingthetemperatureofthesamplestagesuchthataplasmaisirradiatedtoasampletobeplacedonsaidsamplestage.

14.Aplasmageneratingapparatusaccordingtoclaim10,whereinthemagneticfieldapplyingmeanshasapairofupperandlowercoilssodisposedastobeverticallyoppositetoeachother,andpowersuppliesforrespectivelyapplyingelectriccurrentstosaidpairofcoils.

15.Aplasmageneratingapparatusaccordingtoclaim14,whereinthepowersupplieshavemeansforapplying,tothepairofcoils,electriccurrentswhicharesteadywiththepassageoftime.

16.Aplasmageneratingapparatusaccordingtoclaim14,whereinthepowersupplieshavemeansforapplying,tothepairofcoils,electriccurrentswhichareunsteadywiththepassageoftime.

17.Aplasmageneratingapparatusaccordingtoclaim10,whereinthethreeormorelateralelectrodesandthemagneticfieldapplyingmeansaredisposedoutsideofthevacuumchamber.

18.Aplasmageneratingapparatusaccordingtoclaim10,whereinmembersmadeofquartzorceramicsaredisposedbetweentheplasmageneratingpartandeachofthelateralelectrodes,andbetweensaidplasmageneratingpartandthemagneticfieldapplyingmeans.

19.Aplasmageneratingapparatusaccordingtoclaim10,whereinthehighfrequencyelectricpowerapplyingmeanshasphaselockingmeansarrangedsuchthatthedifferencesinphaseamongthehighfrequencyelectricpowersrespectivelyappliedtothelateralelectrodesarethesameaseachother.

20.Aplasmageneratingapparatusaccordingtoclaim10,whereinthehighfrequencyelectricpowerapplyingmeanshasmeansforrespectivelyapplying,tothelateralelectrodes,threeormorehighfrequencyelectricpowerswhicharesuppliedfromthesamepowersupplyandofwhichphasesaredifferentfromoneanother.

21.Aplasmageneratingapparatusaccordingtoclaim10,whereinthewallofthevacuumchamberismadeofanonmagneticmaterial.

22.Aplasmageneratingapparatusaccordingtoclaim10,whereinthewallofthevacuumchamberismagneticallyshielded

Description

BACKGROUNDOFTHEINVENTION

Thepresentinventionrelatestoaplasmageneratingmethodandaplasmageneratingapparatususingthesame.

Aplasmageneratingmethodusinghighfrequencyelectricdischargeisusedinthefieldsofdry-etchingapparatusformicrofabrication,plasmaCVDapparatusorsputteringapparatusforformingthinfilms,ionimplantationapparatusandthelike.Insuchaplasmageneratingmethod,itisrequiredtogenerateaplasmaunderahighvacuuminordertominiaturizethefeaturesizesortocontrolthefilmqualitywithhighprecision.

Thefollowingwilldiscussadryetchingmethodformicrofabricationasanexampleofapplicationoftheplasmageneratingmethod.

TherecentprogressinthefieldofhighlydensesemiconductorintegratedcircuitsisbringingaboutgreatchangesequivalenttothosebroughtbytheIndustrialRevolution.Thehighlydensearrangementofasemiconductorintegratedcircuithasbeenachievedbyminiaturizationofelementdimensions,improvementsindevices,provisionoflarge-areachipsandthelike.Elementdimensionsarenowminiaturizedtotheextentofthewavelengthoflight.Inlithography,theuseoflaserorsoftX-rayistakenintoconsideration.Torealizemicro-patterns,dryetchingplaysanimportantroleaslithographydoes.

Dryetchingisaprocesstechnologyforremovingunnecessarypartsofathinfilmorasubstratewiththeuseofchemicalorphysicalreactionsonthesurfaceofagas-solidphaseofradicals,ionsorthelikepresentinaplasma.Asdryetching,thereismostwidelyusedareactiveionetching（RIE）,accordingtowhichasampleisexposedtoahigh-frequencydischargeplasmaofasuitablegas,sothatanetchingreactionisgeneratedonthesamplesurfacetoremoveunnecessarypartsthereof.Generally,thenecessarypartsorpartsnottoberemovedofthesamplesurface,are