赫尔槽测试中英对照版.docx

1、赫尔槽测试中英对照版The Hull Cell (U.S. Patent # 2,149,344) is a miniature test cell 小型测试槽designed to produce a plated deposit 电镀层over a range of current densities在一定电流密度范围内. The deposit is dependent upon the condition of the plating bath (i.e. concentration of primary components, addition agents and impuriti

2、es杂质). The Hull Cell is a useful tool for varying不同的 chemical composition, determining covering power (the lowest current density at which a deposit is produced产生), measuring average cathode efficiency, average metal distribution or throwing power, and observing the effects of pH, temperature and de

3、composition products分解产物. A clear Lucite Hull Cell透明的合成树脂赫尔槽 enables the operator to observe the plating on the back背面 of the test panel to determine relative throwing power相对均镀能力 at very low current densities.赫尔槽（美国专利2149344）是一种被设计用来在一定电流密度范围内产生电镀层的小型测试槽。电镀层的状况由电镀液的状况决定（主盐成分，添加剂和杂质）。赫尔Cell是一种有用的工具，

4、为不同的化学组成，确定覆盖能力（最低电流密度产生的镀层），测量平均电流效率，金属平均分配或分散能力，并观察pH值温度和分解产物的影响，。一个透明的合成树脂赫尔槽能够让操作者通过观察试片背面的镀层，以确定在非常低的电流密度下的相对覆盖能力。The Hull Cell was originally developed by the R. O. Hull Company, which later became the ROHCO Division of McGean-Rohco, and is now part of Atotech. The Hull Cell has become an inte

5、gral part of plating operations everywhere. 赫尔槽最早由赫尔公司发明，该公司现在是安美特公司的一个部分，赫尔槽已经成为世界各地电镀操作的一个必须部分。ADVANTAGESThe Hull Cell enables an experienced有经验的 operator to determine the following facts about a plating solution:1. Approximate Bright Current Density Range.近似光亮电流密度的范围 This is accomplished by compa

6、ring the bright plated areas光亮镀层范围 on the panel with current densities given给定的 in a chart. If the bright or operable range光亮或可操作范围 is between 1-1/4” (3.2 cm) and 2-1/2 “(6.4 cm) from the left side of the panel, and the total current applied is 3 Amps,the corresponding respective current densities f

7、rom a Hull Cell ruler赫尔槽尺 or chart lie between 75 Amps/ft2 (7.6 Amps/dm2) and 25 Amps/ft2 (2.7 amps/dm2). Since these values represent extreme limits, it does not follow that either of these current densities can be used in a plating bath without obtaining a poor deposit差的镀层. However, some intermedi

8、ate current density中间电流密度 such as 50 Amps/ft2 (5.4 Amps/dm2) should work best.优点：赫尔槽可以让有经验的操作者确定电镀液的以下状况：1. 近似光亮电流密度的范围。这是通过用给定的电流密度下比较在试片上的光亮镀层范围来实现。如果光亮或可操作的范围为从试片的左边算起 1-1/4”（32厘米）和2-1/2”（6.4厘米），提供的总电流为3安培，从各自的相应赫尔槽尺或图表电流密度读出电镀范围为 75Amps/ft2。（7.6 Amps/dm2）和25 Amps/ft2（2.7 amps/dm2）。由于这些值代表了极限，但是这

9、不表示这些电流密度可以在任一镀液中使用而不产生差的镀层。所以，一些中间电流密度，如50 Amps/ft2（5.4 Amps/dm2）是最合适的。2. Approximate大概 Concentrations of Primary Constituents主要成分 such as zinc metal content, sodium cyanide content, nickel metal content, etc. Generally, the higher the metal content of a bath, the higher (but not necessarily wider)

10、 is the operable bright current density range.3. Addition Agent Concentration用量. Although a few addition agents can be determined by analysis, the Hull Cell test usually provides the only satisfactory means of controlling the addition of these materials, provided they exhibit a visible effect on the

11、 deposit.4. Metallic or Organic Impurities in a plating bath affect the appearance of the Hull Cell deposit, and their presence or absence是否存在 can be established.2. 主要成分的大概浓度。如锌金属含量，氰化钠，镍金属含量等，一般来说镀液的金属含量越高可操作的光亮电流密度越高。（但不一定是更宽的）3. 添加剂用量。虽然有少数添加剂可以分析，赫尔槽试验通常提供了控制这些添加剂唯一令人满意的方法，只要添加剂在镀层上产生可见的效果。4. 镀液

12、中的金属或有机杂质会影响试片的外观，因此可以判断这些杂质是否存在。TEST METHODSBefore running进行 a Hull Cell plating test, the following steps must be taken:1. Bring the solution to be tested to its normal operating level in the plating tank.2. Either stir the bath thoroughly or use a sampling tube采样管 extending to the bottom of the t

13、ank and go over the tank uniformly from one end to the other.3. The temperature of the bath sample should be maintained at the proper operating temperature during the test. The best method for testing samples at high temperatures在较高温度下 is by using a Model HT Hull Cell, which is equipped with a heati

14、ng element and thermostat可加热和控温的赫尔槽.分析方法在进行赫尔槽测试前，以下的步骤必须遵循1使要进行测试的镀液操作条件和镀槽里的一样。2要么彻底搅拌镀液或使用采样管延伸到镀槽底部从镀槽的一边转到另一边。3.在测试时测试镀液的温度必修保持在一定的操作范围，一些要在较高温度下测试的镀液，最好采用可加热和控温的赫尔槽4. Use a clean Hull Cell and clean the cathode panel试片. If more than one type of plating solution is to be tested regularly, one c

15、ell should be used exclusively for each type to avoid cross contamination交叉污染.5. Hull Cell plating tests do not eliminate the need for occasional chemical analysis. Such analyses should be made before the plating test so that the bath sample can be adjusted调整 to the optimum composition either prior

16、to or during the sequence of Hull Cell tests.4使用清洁的赫尔槽和试片。赫尔槽最好专用，避免不同镀液的交叉污染。5赫尔槽测试不能取消代替必要的化学分析，在赫尔槽测试前应分析样品，以便镀液可以在赫尔槽测试时调整到最佳的范围。6. Zinc coated steel cathode panels must be stripped of the zinc退掉锌层 by immersing them into a 1:1 solution of hydrochloric acid and water, rinsed and then cleaned with a wet, clean cloth or wet paper towel, just before use. Since the Hull Cell is an actual plating tank, improperly prepared panels will n