二阶效应MOSFET的非理想特性Word格式文档下载.docx

上传人:b****1 文档编号:15330899 上传时间:2022-10-29 格式:DOCX 页数:18 大小:252.11KB
下载 相关 举报
二阶效应MOSFET的非理想特性Word格式文档下载.docx_第1页
第1页 / 共18页
二阶效应MOSFET的非理想特性Word格式文档下载.docx_第2页
第2页 / 共18页
二阶效应MOSFET的非理想特性Word格式文档下载.docx_第3页
第3页 / 共18页
二阶效应MOSFET的非理想特性Word格式文档下载.docx_第4页
第4页 / 共18页
二阶效应MOSFET的非理想特性Word格式文档下载.docx_第5页
第5页 / 共18页
点击查看更多>>
下载资源
资源描述

二阶效应MOSFET的非理想特性Word格式文档下载.docx

《二阶效应MOSFET的非理想特性Word格式文档下载.docx》由会员分享,可在线阅读,更多相关《二阶效应MOSFET的非理想特性Word格式文档下载.docx(18页珍藏版)》请在冰豆网上搜索。

二阶效应MOSFET的非理想特性Word格式文档下载.docx

∙BodyEffect(BackGateEffect)

oPhysicalProcess

oMathematicalFormulae

∙DrainInducedBarrierLowering(DIBL)

∙LeakageCurrentEffects

oSubthresholdConduction

oGateTunneling

oReverseBiasDiodeCurrent(JunctionLeakage)

∙MOSCapacitor

oModesofoperation

oCapacitance-Voltage(CV)characteristics

∙ParasiticComponents

oParasiticCapacitanceinMOSFET

oParasiticResistanceinMOSFET

∙Conclusion

ShortChannelEffects

Mostofthenon-idealeffectswewilldiscussinthispostareduetowhatiscommonlyregardedas“ShortChannelEffects”.

Generally,inordertoimprovetheperformanceandreducethecostofproduction,onewouldprefertoscaledownthesizeofthetransistors.Thisscalingdownalsoeliminatesmanystraycapacitancesthatarepresentintheoveralldevice.Ultimatelyincreasingthespeedofoperation.

Butwhenthechannellengthisscaleddowntotheorderofthedepletionlayer,acertainnumberofnon-idealeffectscomeintoplay.These 

second-ordereffects 

willbethemainfocusofthispost.

ChannelLengthModulation

Aswekeeponincreasingour 

 

theregionforwhichtheinversionchargeiszerokeepsonincreasingforaconstantvalueof 

maintained.Thusourchannellengthkeepsondecreasing.ThisphenomenoniscalledChannelLengthModulation.

SomeofusmightbefamiliarwithasimilareffectinthecaseofBJTknownas“BaseWidthModulation“.Thuswegeta 

termintheexpressionfor 

evenwhenweareoperatinginthesaturationregion.

Generally,thefabricationoftheMOSFETdevicesisdoneinawaysuchthatthechangeinlengthgivenby 

islowwithachangein 

.

Figure1:

Reductioninthechannellengthduetochannellengthmodulation

Modelforchannellengthmodulation

Tomodelthechannellengthmodulation,weusethefollowingconstructs:

;

here 

isaparameterthatisusedtoquantifythechannellengthmodulationeffect.Wealwaysaimatkeepingthe 

assmallaspossible.

Solving,weget 

then,usingbinomialapproximationweget:

Hence, 

Insertingtheaboveresultinthecurrentequationforsaturationmodeweget:

Hencefromtheequationonecanseetherelationof 

with 

isparabolicandwith 

islinearforsaturationregionoperation.

Figure2:

OverallidealIVcharacteristicsofanNMOStransistorconsideringchannellengthmodulation

Intheplotoffigure2,wecanseetheeffectofChannelLengthModulation,hereevenwhen 

.Therisein 

islinearw.r.t. 

insaturationregion.

Ideally,wewouldwantthecurrenttosaturateuponcethedrain-to-sourcevoltageexceedstheoverdrivevoltage.Hencetheleastthevariationofcurrentinthesaturationregionthebetteristhequalityoftransistoroperation.Theparameter 

givestheslopeofthecurrentcurveinthesaturationregion.Thuswewouldwantour 

tobeassmallaspossible(recallthatintheidealcase,itwaszero).Practically 

decreasesasourchannellength(L)increases.

EarlyVoltage

Figure3:

ExtrapolationofsaturationcurrentcurvestoobtainthevalueofEarlyvoltage

SupposewetakethedifferentIVcurvesintheirsaturationregionandextrapolatethemtowardsthenegativeaxisfor 

.Wewillobservethattheseextrapolatedlinescutthe 

axisatacertainvaluegivenby 

.Thequantity 

isalsoreferredtoasearlyvoltage 

.SomoreistheEarlyvoltage 

betteristheperformanceofourMOSFETinthesaturationregion.

MobilityDegradation(SurfaceScattering)

Practically,theelectronstravelingfromthesourcetodraininanNMOSdon’tfollowastraightpath.Formostcases,thelateralelectricfieldismuchmorethantheverticalelectricfield.Butstill,thereissomenon-zeroverticalelectricfieldpresentintheinversionchannel.

Figure4:

Effectivepathfollowedbytheelectronsduetosurfacescattering

Supposeanelectronisstartingfromthesourceterminaledge,asshowninfigure4.Thiselectronwillbeundertheinfluenceofboththeelectricfields.Thusitwillmovetowardsthedrainandalsowillbeattractedtowardstheoxidelayer(Keepinmindthatthepulltowardstheoxidelayerwillbeverylow).Astheelectrongetsveryclosetothepracticallyunevenoxideinterface,itwillbescatteredandfollowapathtowardsthedownwarddirection.Againthiselectronwillbeattractedbytheelectricfield,andtheprocesscontinues.Thustrajectoryfortheelectronwillbemoreofazig-zagoneratherthanalinearone.

Thiseffectwillonlybedominantfortheelectronsthatareclosertotheoxideinterface.Astheverticalelectricfieldisweaker,mostoftheelectronswhichstartfarawayfromtheoxideinterfacewillreachthedrainbeforetheyencounterascatteringevent.Butaswescaledownthesizeofthetransisto

展开阅读全文
相关资源
猜你喜欢
相关搜索

当前位置:首页 > 成人教育 > 专升本

copyright@ 2008-2022 冰豆网网站版权所有

经营许可证编号:鄂ICP备2022015515号-1