二阶效应MOSFET的非理想特性Word格式文档下载.docx
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∙BodyEffect(BackGateEffect)
oPhysicalProcess
oMathematicalFormulae
∙DrainInducedBarrierLowering(DIBL)
∙LeakageCurrentEffects
oSubthresholdConduction
oGateTunneling
oReverseBiasDiodeCurrent(JunctionLeakage)
∙MOSCapacitor
oModesofoperation
oCapacitance-Voltage(CV)characteristics
∙ParasiticComponents
oParasiticCapacitanceinMOSFET
oParasiticResistanceinMOSFET
∙Conclusion
ShortChannelEffects
Mostofthenon-idealeffectswewilldiscussinthispostareduetowhatiscommonlyregardedas“ShortChannelEffects”.
Generally,inordertoimprovetheperformanceandreducethecostofproduction,onewouldprefertoscaledownthesizeofthetransistors.Thisscalingdownalsoeliminatesmanystraycapacitancesthatarepresentintheoveralldevice.Ultimatelyincreasingthespeedofoperation.
Butwhenthechannellengthisscaleddowntotheorderofthedepletionlayer,acertainnumberofnon-idealeffectscomeintoplay.These
second-ordereffects
willbethemainfocusofthispost.
ChannelLengthModulation
Aswekeeponincreasingour
theregionforwhichtheinversionchargeiszerokeepsonincreasingforaconstantvalueof
maintained.Thusourchannellengthkeepsondecreasing.ThisphenomenoniscalledChannelLengthModulation.
SomeofusmightbefamiliarwithasimilareffectinthecaseofBJTknownas“BaseWidthModulation“.Thuswegeta
termintheexpressionfor
evenwhenweareoperatinginthesaturationregion.
Generally,thefabricationoftheMOSFETdevicesisdoneinawaysuchthatthechangeinlengthgivenby
islowwithachangein
.
Figure1:
Reductioninthechannellengthduetochannellengthmodulation
Modelforchannellengthmodulation
Tomodelthechannellengthmodulation,weusethefollowingconstructs:
;
here
isaparameterthatisusedtoquantifythechannellengthmodulationeffect.Wealwaysaimatkeepingthe
assmallaspossible.
Solving,weget
then,usingbinomialapproximationweget:
Hence,
Insertingtheaboveresultinthecurrentequationforsaturationmodeweget:
Hencefromtheequationonecanseetherelationof
with
isparabolicandwith
islinearforsaturationregionoperation.
Figure2:
OverallidealIVcharacteristicsofanNMOStransistorconsideringchannellengthmodulation
Intheplotoffigure2,wecanseetheeffectofChannelLengthModulation,hereevenwhen
.Therisein
islinearw.r.t.
insaturationregion.
Ideally,wewouldwantthecurrenttosaturateuponcethedrain-to-sourcevoltageexceedstheoverdrivevoltage.Hencetheleastthevariationofcurrentinthesaturationregionthebetteristhequalityoftransistoroperation.Theparameter
givestheslopeofthecurrentcurveinthesaturationregion.Thuswewouldwantour
tobeassmallaspossible(recallthatintheidealcase,itwaszero).Practically
decreasesasourchannellength(L)increases.
EarlyVoltage
Figure3:
ExtrapolationofsaturationcurrentcurvestoobtainthevalueofEarlyvoltage
SupposewetakethedifferentIVcurvesintheirsaturationregionandextrapolatethemtowardsthenegativeaxisfor
.Wewillobservethattheseextrapolatedlinescutthe
axisatacertainvaluegivenby
.Thequantity
isalsoreferredtoasearlyvoltage
.SomoreistheEarlyvoltage
betteristheperformanceofourMOSFETinthesaturationregion.
MobilityDegradation(SurfaceScattering)
Practically,theelectronstravelingfromthesourcetodraininanNMOSdon’tfollowastraightpath.Formostcases,thelateralelectricfieldismuchmorethantheverticalelectricfield.Butstill,thereissomenon-zeroverticalelectricfieldpresentintheinversionchannel.
Figure4:
Effectivepathfollowedbytheelectronsduetosurfacescattering
Supposeanelectronisstartingfromthesourceterminaledge,asshowninfigure4.Thiselectronwillbeundertheinfluenceofboththeelectricfields.Thusitwillmovetowardsthedrainandalsowillbeattractedtowardstheoxidelayer(Keepinmindthatthepulltowardstheoxidelayerwillbeverylow).Astheelectrongetsveryclosetothepracticallyunevenoxideinterface,itwillbescatteredandfollowapathtowardsthedownwarddirection.Againthiselectronwillbeattractedbytheelectricfield,andtheprocesscontinues.Thustrajectoryfortheelectronwillbemoreofazig-zagoneratherthanalinearone.
Thiseffectwillonlybedominantfortheelectronsthatareclosertotheoxideinterface.Astheverticalelectricfieldisweaker,mostoftheelectronswhichstartfarawayfromtheoxideinterfacewillreachthedrainbeforetheyencounterascatteringevent.Butaswescaledownthesizeofthetransisto