1MSA 还原炉设备说明概要.docx

1、1MSA 还原炉设备说明概要技术文件MSA还原炉MSA化学设备有限公司2007年12月30日目录1 系统描述1.1 工艺原理1.2 控制参数2 主要设备说明2.1 概念和容积2.2 尺寸2.3 设计数据2.4 反应器功能2.5 底座2.6 反应器-筒体2.7 显示屏2.8 电极2.9 混合气体供气管道2.10 废气管3 设备数据及致冷系统要求3.1 沉积反应器3.2 沉积反应器部件表3.3 沉积反应器致冷系统3.4 李比希管3.5 混合气体系统TCS加压系统3.6 沉积反应器气体控制器4 电流、电压曲线及材料供应和装卸值4.1 沉积反应器电流、电压曲线4.2 材料供应和装卸值5 清洗工艺参考值

2、6 参考信息6.1 结晶物去除装置6.2 反应器筒体清洁装置6.3 绝缘7 附图纸7.1 工艺控制图纸7.2 原材料及有用消耗结构表The delivery of a Reactor Set, comprising the Reactors and the Reactors Components will ensure a balanced functionality.还原设备交付，包括还原设备筒体及其它组成部分以确保功能的平衡。Notice: The MSA Reactors Type HER 12 have their big advantage in high productivity

3、and low energy consumption, due to their approved geometry, which allows 12 doubles in each Reactor, of a length of 2 800 mm and the optimised Mixed-gas supply, controlled by several Mixed-gas inlet jets and valves in the Reactor Base-plate.备注：MSA HER 12 型还原设备在高生产效率和低能源损耗方面有很强的优势，根据几何学原理，每个筒体内允许有12对

4、长2800mm的载体和优化的混合气体供应，由许多安装在反应器底座的混合气体进口喷嘴和阀门控制。Description and specification of the delivery content:设备说明及规格1. Deposition-Reactor还原设备 The Reactor consists of a cylinder case and a base-plate. 还原设备由筒体和底座组成。Cylinder-case and the base-plate are surrounded with a cooling cabinet.致冷柜环绕在筒体和底座四周。All surfac

5、es, which are in direct contact with the process arestainless-steel, electropolished.所有会有直接接触的表面都使用不锈钢工艺，及电抛光材料。The following parameters and data have been considered:以下参数及数据已经被考虑到。1.1 Concept and capacity Number of Doubles 数量 对 12 Lengths of Doubles 长度 对 2.800 mm Deposition rate Average(diameter) 平

6、均沉积速率(直径) 0,7-1,0 mm/h Deposition diameter approx. 沉积直径约 85-150 mm Cycle of 1 operation 一个操作周期 8 days Loading time 装料时间 1 day Unloading time 卸料时间 1 day Deposition time 沉积时间 6 days Operating time 操作时间 336 days/year Operating cycles 操作周期 42 cyc/year 42周期/年 Up-time 正常运行时间 92 % Polysilicon per cycle (10

7、0 mm) 每周期多晶硅 1260 kg Polysilicon per year per Reactor min. 每年每个反应器多晶硅最小产量 53 to 吨 Polysilicon per cycle (150 mm) 每周期多晶硅(150mm) 2850 kg Polysilicon per year per Reactor max. 每年每个反应器多晶硅最大产量 120 to 吨Notice: If the Reactors only would be used for the production of solar-grade Poly-Silicon, the cycle tim

8、e may be reduced and therefore the production capacity could be increased.备注:如果反应器只是使用在太阳能级多晶硅生产上,周期时间可以缩短且生产能力可以提高. The conditions to achieve above mentioned production capacity are: 要达到以所涉及到生产能力的备件: high-purity SiHCl3 and H2 ( e.g. 500 ppb H2O ) 高纯SiHCl3和 H2 (例如500ppb H2O) well trained and experie

9、nced operating staff 经验丰富训练有素的团队 uninterrupted utility infrastructure supply 不间断公用设施供应 dedicated process facilities to the entire process 整个工艺的指定工艺设施 advanced technology and process experience 先进的技术和工艺经验 optimised operating parameters 优化的操作参数 1.2 Dimension 尺寸 Diameter outside Reactor Cylinder 反应器筒体外

10、径 ca. 1600 mm Diameter outside Cooling cabinet 致冷柜外径 ca. 1650 mm Height including top-flange 高度包括发兰 ca. 5000 mm Material of Reactor 反应器材质 不锈钢 stainless-steel 1. 4404/316L1.3 Design data 设计数据 Design and calculation accord. to EPD 97 /23 EG (European Norm)设计及计算依据 EPD 97 /23 EG(欧洲标准) Testing accord. to

11、 AD 2000 (German/European Norm)测试依据 AD 2000(德国和欧洲标准) Additional Chinese requirements for Pressure Vessels considered其它中国相关中国容器压强也已考虑到 Numbers of power supply connections 24电源供应连接数 24 Numbers of Material-gas inlet jets 9材料气体进口喷嘴数 9 Numbers of show glasses 3显示屏数 3 Weight approx. 10 to 重量约 10吨 Volume a

12、pprox. 6 m 量约 6 m Volume of cooling cabinet approx. 0,5 m 致冷柜量约 0,5 m 1.4 Reactor functionality 反应器功能 The Reactor-body contains 12 Filament-Doubles of high-purity silicon for the deposition of the PolySilicon. The material used for the deposition process will be high- purity Trichlorosilane mixed wi

13、th high-purity Hydrogen反应器包含用于多晶硅沉积的12对高纯硅棒。沉积工艺用的原料是高纯度SiHCL3和H2。 The Trichlorosilane will be mixed with the Hydrogen and supplied to the Reactor through 9 jets, which are integrated into the base-plate of the Reactor. SiHCL3和H2混合通过9个喷气口供应到反应器，9个喷气口和反应器完整的结合在一起 Integrated into the base-plate are al

14、so 24 power supply connections, consisting of silver plated brass, isolated with PTFE reinforced with glass fibre. The connection parts to the 12 Doubles are of graphite material (supplied by client). 和底座结合的还有24个电源供应连接，包括,镀银黄铜组件，由聚四氟乙烯隔离、玻璃纤维加固。12对高纯硅棒的连接设备是高纯度石墨材料。 The deposition of the Poly-Silico

15、n happens concentrically, up to a diameter of approx 100-150 mm. The growth of the Poly-Silicon will beapprox. 0,7-1 mm / hour.沉积的多晶硅聚集成一个直径大约150毫米棒.多晶硅生长速度约为 0.81毫米/小时。过程中要求一定的SiHCl3 和 H2剩余量. The process requires a certain surplus on SiHCL3 and H2. This surplus will be exhausted over the base-plate

16、 and has to be leaded to a recovery/recycling system, for direct re-use of SiHCl3 and H2 in the Vaporizer, or conversion of SiCl4 by hydrogenation and re-delivery of HCl-gas to the SiHCl3 generation plant. The deposition process takes approx 6 days. The removal, cleaning and re-loading requires appr

17、ox. 1-2 days. Though the entire cycle-time will be approx. 8 days.Notice: Above mentioned time frame may also be reduced by experienced operating parameters and well-trained operators剩余气体将通过底盘，并必须导入回收/再循环系统，通过蒸馏器直接再利用SiHCl3和氢气的，或将四氯化硅氢化转化，并和HCl气体一道重新进入SiHCl3合成车间。根据操作经验，沉积过程电子极需要大约5天，太阳能极约6天。 拆除清理和重新

18、装载大约需要1-2天，一个周期大约为 7-8天.备注：以上时间因素可能减少，因为成熟的操作因素，专业的操作员工，和考虑多晶硅的质量。Reactor-Construction 反应器结构1.5 Base-plate 底座 The Reactor Base-plate is water cooled in order to protect the base-plate seal and Electrodes isolation from overheating. Integrated into the base-plate are 24 penetrations for the Electrode

19、s and 9 penetration for the Material-supply jets. All penetration are welded into the base-plate. The base-plate is flanged to the body cylinder, using clamp-screws. The exhaust pipe connection flange is DN 80 mm and cooled, using the cooling water outlet.反应器底座采用水冷却，冷却水温度最低为130150. 温差最低应为20以防止底座密封和电

20、极绝缘过热. 这个通道连接在3656MT致冷温度回路。与底座完整结合的是24个电极、9个原料供应喷口，所有贯穿的底座的孔均与底座连成整体。底座与筒身通过法兰用螺丝紧固。冷却水进口尺寸为DN100（内径100mm），废气管道尺寸为DN80，双管道，在底座用冷水冷却废气. The cooling of the electrodes are provided with flexible pipes, material plastic, for electrical isolation. The cooling temperature should be 40 / 60 C.1.6 Reactor-c

21、ylinder 反应器筒体 The Reactor-cylinder is flanged with clamp-screws to the Reactor base- plate. This flange connection has to be loosened for loading and un- loading the Reactor. On top the Reactor cylinder will be equipped with a flange, which can beused to insert a heating device into the Reactor for

22、initialling the filaments. The Reactor-body stands on a feet-rack, on which protection-elements for the area of the power connections are attached. 反应器筒体与底座通过法兰用螺丝紧固，该法兰连接必需可以装卸反器。为观察和评估反应器中的反应过程,设3个显示玻璃，材质为石英玻璃。反应器顶部将装有法兰，它可以用来插入一个加热器进入反应器预热硅棒，反应器放置在一个地脚架上，这是为保护电源连接而设立的。 Reactor Armatures 反应器电枢1.7

23、Show-glasses 显示屏 The Reactor will be equipped with 3 show-glasses.1 show-glass is determined for the temperature measurement of the rod temperature and 2 show glass are used for visual controlling of the filament and the deposition process. The show-glasses are water cooled. They consists of 2 glass

24、es. The inside glass material is quartz the outside borosilicate. For to avoid clouding the inside glass will be rinsed, using H2.反应堆将装备3块显示屏，显示屏1显示测温棒的温度，显示屏2用于观察和控制硅棒和沉积过程.。 显示屏用水冷却，由两块玻璃组成。内层为石英玻璃，外层为硼硅酸盐。为避免内壁潮湿，玻璃将会用氢气冲洗。1.8 Electrodes 电极 For the connection of the 12 Doubles, 24 Electrodes are

25、assembled into the Reactor base-plate. The Electrodes are water cooled. For isolation purposes PTFE reinforced material is used. The connection to the power supply lines happens with copper set- screws. Inside in the Reactor the Electrodes-head is silver-plated (100 ).The graphite device for fixing

26、the filaments (delivered by client) is fixed on the electrodes-head. The filaments are put into this device with square or round connection.因为要连接12对棒，所以24根电极装配在反应器底座，电极使用水冷却，连接在MT致冷回路，使用超纯水。为绝缘使用聚四氟乙烯加强材料。连接电源线使用铜固定螺丝。在反应器内的电极头是镀银(100)，石墨装置将硅芯固定在电极，石墨装置将由买方提供，卖方提供足够的石墨装置规格和供应方面的资料。硅芯放在石墨中时使用方形或是圆形连接

27、。1.9 Mixed-gas supply pipes混合气体供应管 For the mixed-gas supply into the Reactor a ring-pipe system will be installed and connected to the mixed-gas inlet jets in the bottom-plate. For to adjust the mixed-gas volume stream for the individual jets, each jet is fitted-out with a manual membrane-valve.为反应器

28、供应混合气体的环管系统将在底板上安装和连接混合气喷口。为调整单个喷口混合气流量,每个喷口有一个隔膜阀。1.10 Exhaust-gas pipe废气管For the exhaust from the Reactor an exhaust pipe will be installed.This exhaust pipe is connected to the Reactor bottom-plate and ends with a double flange.The pipe is a double-pipe for cooling purposes. Flanges for cooling c

29、onnections are provided.反应器的废气排气管的安装. 排气管与反应器底板采用双法兰连接.管道采用双管、法兰连接冷却. 1.11 Heat insulation 绝热 The Reactor must be completely insulated with a heat protection system. This system will be provided by client反应器将用热防护系统完全绝热. 这个热防护系统将由买方提供. 2. Gas-console 气体控制台The Gas-console will be installed between the

30、 Reactor and the Injection- system.The Gas-console will be fitted-out with mass-flow controller measurement and security devices, for to control the gas streams and shut on and off the Reactor for normal operating and in case of emergency situations.Each Reactor will be connected to a dedicated Gas-

31、console.气体控制台安装在反应器和TCS供应容器之间。气体控制台将安装质量流量控制器和安全装置，以控制TCS和氢气流在正常作业以及出现紧急情况下与反应器的连通与关闭。3.1 Functionality 功能 The material components serving the Reactor are: 反应器原料组成 Trichlorsilane ( SiHCl3 ) for Mixed-gas SiHCl3混和气体 Hydrogen ( H2 ) for Mixed-gas 氢气混和气体 Hydrogen ( H2 ) for rinsing the Show-glasses 显示屏清洗H2 Nitrogen ( N2 ) for rinsing purposes 用于清洗的氮气 Mass-flow valves are installed to control the ration SiHCl3/H2 and the Mixed-gas volume stream质量流量控制器安装控制：3.2 Gas-console construction 气体控制台的建造 G